Waferpedia

Comparison ledger

0020 23839 PartversusPECVD4

Applied Materials 0020 23839 Part, Oxford Instruments PECVD4, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0020 23839 PartApplied Materials
PECVD4Oxford Instruments
OEMApplied MaterialsOxford Instruments
CategoryDepositionDeposition
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0020 23839 PartOxford Instruments PECVD4
Cited variants—
  • Oxford PECVD4 - SiOx[1]
  • Oxford PECVD4 - SixNy[1]
Specifications
ConfigurationPlate, Sensor Clamp, Hdpcvd Ultima +[2]—
OEM—Oxford Instruments[1]
Model—PECVD4[1]
Full equipment name—Oxford Plasmalab System 100 PECVD System[1]
Process reference—PECVD SiOx Deposition with 81MHz Power[1]

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Sources (2)Every fact above is drawn from these public sources
  1. [1]nanolab.berkeley.edunanolab.berkeley.edu
  2. [2]inventory listing