Waferpedia

Comparison ledger

0020 17485 PartversusOpAL

Applied Materials 0020 17485 Part, Oxford Instruments OpAL, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0020 17485 PartApplied Materials
OpALOxford Instruments
OEMApplied MaterialsOxford Instruments
CategoryDepositionDeposition
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0020 17485 PartOxford Instruments OpAL
Specifications
ConfigurationStrap, RF Out 2 Balanced Coil Match, Hdp[1]Single open loop chamber (non-loadlocked)[2]
Heated table—80-300ºC[2]
Voltage—208V, 3Ph, 60Hz, 25A[2]

Plan your fab

Building a Deposition process? Get a complete equipment list.

Open the fab equipment planner →
Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing