Comparison ledger
Applied Materials 0010-03254 E Chuck, Nikon S 308 F, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03254 E ChuckApplied Materials | S 308 FNikon |
|---|---|---|
| OEM | Applied Materials | Nikon |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | — | Nikon S 308 F |
| Specifications | ||
| Configuration | — | HDD included[1] |
| Light source | — | ArF (193 nm)[2] |
| Numerical aperture | — | 0.92[2] |
| Exposure area | — | 26 x 33 mm[2] |
| Reduction ratio | — | 1:4[2] |
| Resolution | — | <65 nm[2] |
| Throughput (300 mm) | — | >145 wph[2] |
| Throughput (200 mm) | — | >165 wph[2] |
| Wafer size | — | 200/300 mm[2] |
| Overlay accuracy | — | 8 nm[2] |
| Polarization control | — | POLANO[2] |
| Wafer size (alternative) | — | 12 inch[1] |
| Wavelength | — | 193 nm[2] |
| Lens NA | — | 0.92[2] |
| Polarization Control | — | POLANO (optional)[2] |