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Tokyo Electron

Tactras RLSA Polysilicon

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This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.

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What it is

General reference — not yet source-verified

The Tactras RLSA is a dry etch tool used in semiconductor front-end fabrication. The machine removes polysilicon films from a wafer surface by plasma processing. Each wafer is processed individually in a vacuum chamber.

How it works

General reference — not yet source-verified

Plasma etching uses a reactive gas mixture inside a low-pressure vacuum chamber. Microwave or radio-frequency power ionizes the gas into a plasma. The plasma reacts with the exposed film on the wafer surface. Charged particles in the plasma also bombard the wafer to remove material directionally.

Where it fits in the process flow

General reference — not yet source-verified

The Tactras RLSA is used in the front-end portion of the semiconductor manufacturing line. The polysilicon etch step follows a photolithography step that patterns a resist layer. The etch step removes polysilicon material in the regions not covered by the resist mask. After etching, downstream steps strip the remaining resist and continue device fabrication.

Applications

General reference — not yet source-verified

Polysilicon etching is used to define gate electrode structures in integrated circuits. The process is applied in the fabrication of both logic and memory devices. The Tactras RLSA is also used for other polysilicon-related structures formed during device production.

What do the numbers mean?

Wafer handling2

Wafer Size (inch)
12 inch[1]
Accurate?
Wafer Size (mm)
300 mm[2]
Accurate?
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Where are the manuals?

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Not publicly documented

Field notes

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Frequently asked questions

Which company manufactures the Tactras RLSA?

Tokyo Electron manufactures the Tactras RLSA.[1][3][2]

What process is the Tactras RLSA used for?

The Tactras RLSA is used for polysilicon etching.[1][3][2]

Not publicly documented

The following facts about the Tactras RLSA Polysilicon are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • Fewer than 3 independently cited specifications for the Tactras RLSA Polysilicon are on record; the remainder await public documentation.

    Answerable by: an OEM datasheet, a cleanroom equipment inventory, or an engineer who operated or installed it

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Tactras RLSA Polysilicon are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the Tactras RLSA Polysilicon are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the Tactras RLSA Polysilicon are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the Tactras RLSA Polysilicon are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

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Sources & citations

Sources (3)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]fabsurplus.com — fabsurplus.comfabsurplus.com
  3. [3]Equipment inventory listing
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Last updated Sep 24, 2026.

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