Tokyo Electron
The Tokyo Electron Alpha 303 i is a vertical furnace for 12-inch (300 mm) wafers. The Alpha 303 i is configured for TEOS, nitride, and cure processes.[1][2][3][4][5]
A vertical furnace processes wafers in a stacked, upright chamber so that heat reaches the wafers in a controlled thermal environment. Furnaces of this class are used for thermal treatment steps that change film properties or drive material movement into or through the wafer surface.
Thermal and diffusion furnaces generally support process steps that depend on time, temperature, and ambient conditions rather than on direct pattern transfer. A vertical layout is commonly used to handle wafers in a compact chamber while maintaining process uniformity across a load.
Process applications and technology nodes documented for this tool.
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The following facts about the Alpha 303 i Vertical are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Alpha 303 i Vertical are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Alpha 303 i Vertical are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Alpha 303 i Vertical are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Alpha 303 i Vertical are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Alpha 303 i Vertical is not on record.
Answerable by: an OEM datasheet or a fab qualification report
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Last updated Oct 9, 2026.
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