Tegal
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The Tegal 903 is an etcher in the Tegal 9XX Series Etchers. The Tegal 903e Table Top, Upgraded is a variant of the Tegal 903. The Tegal 903e Direct Cooled TTW, Standard is another variant of the Tegal 903.[1]

The Tegal 903 is an etch system in the Tegal 9XX series.[1]
An etch tool creates a controlled environment in which process gases interact with energized species to remove selected material from exposed areas of a workpiece.
The Tegal 903 fits in the pattern-transfer portion of semiconductor processing, where material is removed after a masking or patterning step defines the areas to be opened.
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The following facts about the Tegal 903 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Tegal 903 are on record.
Answerable by: OEM historical records or a trade-press announcement
The control-system platform and OS era of the Tegal 903 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Tegal 903 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Tegal 903 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the Tegal 903 are on record.
Answerable by: an OEM parts catalog or a service engineer
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Last updated Oct 3, 2026.
The Applied Materials 0010-47763 is an electrostatic chuck (ESC) assembly used in semiconductor etching processes.
The Applied Materials 0010-16392 is an electrostatic chuck assembly designed for 300 mm wafer processing, featuring a dual electrode configuration.
Oxford Instruments 100 ICP Fluorine is an inductively coupled plasma etcher for fluorine-based etching, supporting cryo DRIE and multiple etch gases including SF6 and C4F8.