Waferpedia

Sumitomo

SWA 20 GD Laser Anneal

Thermal / Diffusion
Research Quality: 20% complete

Provisional entry — research in progress

This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.

SumitomoSWA 20 GD Laser Anneal
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What it is

The Sumitomo SWA 20 GD Laser Anneal is a thermal and diffusion processing tool.[1]

The Sumitomo SWA 20 GD Laser Anneal is a Sumitomo model.[2]

How it works

General reference — not yet source-verified

Laser anneal tools use a directed thermal process to heat selected regions of a wafer and then let the material relax or recrystallize after implantation or other damage.

Anneal equipment in this class supports controlled thermal treatment rather than pattern transfer or deposition.

Where it fits in the process flow

The SWA 20 GD Laser Anneal belongs in the thermal and diffusion segment of semiconductor processing.[1]

Applications

General reference — not yet source-verified

Laser anneal equipment is used for thermal treatment in semiconductor fabrication.

Thermal and diffusion tools support process steps that modify material properties without defining circuit geometry.

What do the numbers mean?

No specifications recorded yet

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Where are the manuals?

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Not publicly documented

Field notes

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Not publicly documented

The following facts about the SWA 20 GD Laser Anneal are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No specifications for the SWA 20 GD Laser Anneal are on record.

    Answerable by: an OEM datasheet, a cleanroom equipment inventory, or an engineer who operated or installed it

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the SWA 20 GD Laser Anneal are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the SWA 20 GD Laser Anneal are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the SWA 20 GD Laser Anneal are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the SWA 20 GD Laser Anneal are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

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Sources & citations

Sources (2)Every fact above is drawn from these public sources
  1. [1]SWA 20 GD Laser Anneal — Sumitomo | Specs, Sourcing & Service | Waferpedia — waferpedia.comwaferpedia.com
  2. [2]Equipment inventory listing
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Last updated Oct 6, 2026.

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