Plasma-Therm
Unaxis Versaline ICP
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
What it is
How it works
The Versaline ICP Etcher includes a load lock chamber, a transfer chamber, and a process chamber with an electrostatic chuck for wafer handling and processing.[1]
The system configuration includes a DSE III module, an RF generator module, a monitor rack, and a chiller unit for temperature control.[1]
Where it fits in the process flow
General reference — not yet source-verifiedICP etching is used in front-end-of-line and back-end-of-line processing for patterning dielectric and metal layers in integrated circuit fabrication.
Applications
General reference — not yet source-verifiedApplications include deep silicon etching for MEMS, through-silicon vias, and other high-aspect-ratio structures requiring anisotropic profiles.
What do the numbers mean?
Power & electrical1
- Includes
- DSE III, Load Lock Chamber, Transfer Chamber, Process Chamber (6" ESC Chuck), RF Generator Module, Monitor Rack, Chiller Unit[1]
Wafer handling1
Configuration & options1
Observed configurations
How individual machines were equipped when they appeared on the secondary market — as listed, per unit. These describe one specific machine, not the model in general.
Unit as listed[1]
- DSE III
- Load Lock Chamber
- Transfer Chamber
- 6" Cassette
- Process Chamber: 6" ESC Chuck Type
- RF Generator Module
- Monitor Rack
- Chiller Unit
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
- IncludesDSE III, Load Lock Chamber, Transfer Chamber, Process Chamber (6" ESC Chuck), RF Generator Module, Monitor Rack, Chiller Unit[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Not publicly documented
The following facts about the Unaxis Versaline ICP are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Unaxis Versaline ICP are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Unaxis Versaline ICP are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Unaxis Versaline ICP are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Unaxis Versaline ICP are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Unaxis Versaline ICP is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (1)Every fact above is drawn from these public sources
- [1]Inventory photo
Last updated Sep 22, 2026.
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