Waferpedia

Nanospec

210XP

ReflectometryNanospec 210XP family
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The Nanospec 210XP is a non-contact spectro-reflectometer. The Nanospec 210XP measures the thickness of transparent films greater than 300 Å, up to two films, on substrates that are reflective in the visible range, such as silicon.[1]

Nanospec210XP
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What it is

The Nanospec 210XP is a reflectometry tool used for film thickness measurement.[1][2]

The Nanospec 210XP is a non-contact spectro-reflectometry instrument for measuring transparent films on reflective substrates such as silicon.[1]

How it works

The Nanospec 210XP measures transparent films that are thicker than three hundred angstroms and can measure up to two layers.[1][2]

Where it fits in the process flow

The Nanospec 210XP belongs in characterization rather than in material removal or deposition.[1][3]

Applications

The Nanospec 210XP is used for manual film thickness measurement of single or dual layer transparent films thicker than three hundred angstroms.[2]

The Nanospec 210XP is suited to transparent films on substrates that reflect visible light.[1]

  • Reflectometry
  • Film thickness measurement

What do the numbers mean?

Wafer handling2

Substrates
Reflective substrates such as silicon[1]
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Substrate compatibility
Substrates reflective in the visible range, such as silicon[1]
Accurate?

Configuration & options8

Equipment type
Reflectometry[1]
Accurate?
Measurement method
Non-contact, spectro-reflectometry[1]
Accurate?
Measured films
Transparent films > 300 Å (up to two)[1]
Accurate?
Manual measurement description
Manual film thickness measurement for single or dual layer transparent films > 300 Å[2]
Accurate?
Technique
Non-contact, spectro-reflectometry[1]
Accurate?
Measurement capability
Thickness of transparent films > 300 Å, up to two films[1]
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Cleanliness group
"All"[3]
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Location
SNF ExFab Paul G Allen L104 Stinson[1]
Accurate?
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Where are the manuals?

Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.

Not publicly documented

Field notes

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Frequently asked questions

What measurement does the Nanospec 210XP perform?

The Nanospec 210XP performs manual film thickness measurement.[2]

Is the Nanospec 210XP a contact tool?

The Nanospec 210XP is non-contact.[1]

What kinds of films can the Nanospec 210XP measure?

The Nanospec 210XP measures transparent films and can measure single or dual layer transparent films.[1][2]

What substrate type is suitable for the Nanospec 210XP?

The Nanospec 210XP is suited to reflective substrates such as silicon.[1]

Not publicly documented

The following facts about the 210XP are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 210XP are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the 210XP are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the 210XP are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the 210XP are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the 210XP is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

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Sources & citations

Sources (3)Every fact above is drawn from these public sources
  1. [1]snfguide.stanford.edu — snfguide.stanford.edusnfguide.stanford.edu
  2. [2]snfguide.stanford.edu — snfguide.stanford.edusnfguide.stanford.edu
  3. [3]snfguide.stanford.edu — snfguide.stanford.edusnfguide.stanford.edu
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Last updated Oct 3, 2026.

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