Mattson
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The Mattson AST 280 RTP is a rapid thermal processing (RTP) system. The Mattson AST 280 RTP is categorized under thermal/diffusion equipment.[1][2]
The Mattson AST 280 is a rapid thermal processing (RTP) system.[1][2]
Rapid thermal processing systems heat wafers using high-intensity radiation sources, typically tungsten-halogen lamps or arc lamps, arranged around the wafer in a reflective chamber.
Temperature is controlled by closed-loop feedback from pyrometers or thermocouples, allowing ramp rates of tens to hundreds of degrees Celsius per second.
RTP tools are typically positioned in the fab after ion implantation processes for dopant activation, after deposition for silicide formation, or before epitaxy for surface preparation.
Additional applications include silicidation, contact alloying, and thin-film densification.
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The following facts about the AST 280 RTP are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No specifications for the AST 280 RTP are on record.
Answerable by: an OEM datasheet, a cleanroom equipment inventory, or an engineer who operated or installed it
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the AST 280 RTP are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the AST 280 RTP are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the AST 280 RTP are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the AST 280 RTP are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
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Last updated Sep 27, 2026.
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