Laurell
The Laurell WS-650-23B is a spin coater used for depositing thin films by centrifugal force. The WS-650-23B handles substrates up to ø150 mm (5"×5") and spins at up to 12,000 RPM (based on a ø100 mm silicon wafer).[1][2]

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The WS-650-23B accommodates wafers up to ø 150 mm and substrates up to 5 inch by 5 inch.[3][1][2]
The WS-650-23B has a maximum rotational speed of 12,000 RPM.[3][1][2]
The following facts about the WS-650-23B are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the WS-650-23B are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the WS-650-23B are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the WS-650-23B are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the WS-650-23B are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the WS-650-23B is not on record.
Answerable by: an OEM datasheet or a fab qualification report
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Last updated Oct 9, 2026.
The Laurell 750 Series is a spin coater line for spin coating applications.
The Laurell EDC-650-23 B is an EDC System 650-series spin coater with a maximum substrate size of ø 150mm (5" × 5") and a maximum speed of 12000 rpm.
The Laurell EDC-650-23B is an EDC System spin coater from the 650 Series, supporting substrates up to 150mm diameter and spin speeds up to 12,000 rpm.
The Laurell EDC-HL-23 B is an EDC System 650-series spin coater with a maximum substrate size of 150 mm (5" x 5") and a maximum speed of 12000 rpm.