Laurell
SU-8
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The Laurell SU-8 is a spin station used for coating substrates with SU-8 photoresist, an epoxy-based negative photoresist designed for micromachining and microelectronic applications requiring thick, chemically and thermally stable images. The SU-8 photoresist is a negative photoresist where parts exposed to UV become cross-linked, while the remainder remains soluble and can be washed away during development. SU-8 derives its name from the presence of 8 epoxy groups on average per moiety.[1][2]
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How it works
SU-8 is a negative epoxy photoresist. The resist is exposed after coating, and the exposed portions crosslink during thermal processing before development removes the unexposed material.[2][1]
Where it fits in the process flow
The Laurell SU-8 fits in the lithography sequence after substrate preparation and coating and before exposure, post-exposure bake, and development. The SU-8 process flow includes spin coat, soft bake, expose, post-exposure bake, and develop.[2]
The FabLab lithography area also includes mask aligners, a maskless aligner, photoresist spin stations, a developing bench, and a photo oven. The Laurell SU-8 spin station belongs to that lithography group of tools.[3]
Applications
SU-8 is used for micromachining and other microelectronic applications where a thick chemically and thermally stable image is desired. The material is suited to high aspect ratio patterning and near vertical sidewalls.[2][1]
SU-8 is used in microfluidics, MEMS, bio-MEMS, and other microfabrication work. The resist can be processed with standard contact lithography at certain thicknesses and is commonly exposed with i-line ultraviolet light.[1][2]
Why won't it start?
Documented failure modes, common issues, and field considerations.
- Above 500 μm thickness, absorption leads to increasing sidewall undercuts and poor curing at the substrate interface
- SU-8 is very difficult to remove after full crosslinking
- Cracking and stress can occur due to thermal effects; controlled baking steps are required
What do the numbers mean?
Wafer handling1
Gas & chemistry3
Optics & imaging4
Configuration & options10
- Maximum Film Thickness (multiple coats or dry film)
- Up to above 300 μm (spun) or above 1 mm (dry film)[1]
What does it need to run?
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
What does the Laurell SU-8 tool do?
The Laurell SU-8 tool is a spin station for SU-8 lithography coating.[3]
What process sequence is used for SU-8?
The SU-8 process sequence is spin coat, soft bake, expose, post-exposure bake, and develop.[2]
What kind of exposure is SU-8 optimized for?
SU-8 is optimized for i-line and broadband exposure, and i-line exposure tools are recommended.[2]
Not publicly documented
The following facts about the SU-8 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the SU-8 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the SU-8 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the SU-8 are not on record.
Answerable by: an engineer who operated it or OEM installation records
The process node or technology generation of the SU-8 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the SU-8 are on record.
Answerable by: an OEM parts catalog or a service engineer
Sources & citations
Sources (8)Every fact above is drawn from these public sources
- [1]en.wikipedia.org — en.wikipedia.orgen.wikipedia.org
- [2]wp.optics.arizona.edu — wp.optics.arizona.eduwp.optics.arizona.edu
- [3]nanocenter.umd.edu — nanocenter.umd.edunanocenter.umd.edu
- [4]cns1.rc.fas.harvard.educns1.rc.fas.harvard.edu
- [5]repository.upenn.edurepository.upenn.edu
- [6]iopscience.iop.orgiopscience.iop.org
- [7]Equipment | FabLab | Maryland NanoCenter — nanocenter.umd.edunanocenter.umd.edu
- [8]Equipment | FabLab | Maryland NanoCenter — nanocenter.umd.edunanocenter.umd.edu
Last updated Sep 30, 2026.
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