Laurell
The Laurell WS-400-6NPP is a manual tabletop spin coater from the 400-series. The WS-400-6NPP can spin substrates up to 150 mm in diameter and 4x4 inch substrates. The WS-400-6NPP uses a 400-series process controller capable of storing and automatically running process recipes consisting of run time and acceleration rate.[1][2]

Wafer size
150mm
Produced
1995–
Power
95 to 240 VAC, 47/63 Hz, ~300 Watts[1]
Vacuum
1.75" (45 mm) diameter vacuum chuck[2]
The WS-400-6NPP uses a 400-series process controller that can store and automatically run process recipes consisting of run time and acceleration rate, or it can be operated manually. The controller features a back-lit display and membrane keypad, and it can store up to 20 programs with up to 51 steps per program. Each step includes a time (from 0.1 seconds to 99 minutes 59.9 seconds), a speed, and an acceleration or deceleration rate.[1][2][3][4]
The substrate is held on a vacuum chuck; the standard chuck has a 1.75" (45 mm) diameter and is supplied with a fragment adapter that covers substrates from 10 mm through 150 mm SEMI wafers. A proprietary labyrinth seal protects the motor and control electronics from chemical contamination and provides a nitrogen purge to the process chamber.[1][2][3]
Safety interlocks prevent rotation when the vacuum hold-down force is insufficient (vacuum interlock) and when the lid is open (lid interlock). A process safeguard feature prevents the same process from being inadvertently run again on the same substrate, though it can be bypassed to allow repeated runs or looping sequences.[1][2][3][4]
Process applications and technology nodes documented for this tool.
Documented failure modes, common issues, and field considerations.
| Designation | Generation | Vintage | Changes | Source |
|---|---|---|---|---|
| WS-400-6NPP | — | 1995 | Described as a manual tabletop system; sources also note a 650-series replacement controller on newer models and that the 650 is not available on 6 series systems. | web.archive.org[1] |
Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
No research found yet — worked with this tool? Share what you know.
The WS-400-6NPP can spin wafers up to 150 mm in diameter and substrates up to 4" × 4" (102 mm × 102 mm).[2][3]
The WS-400-6NPP can achieve 10,000 RPM based on a 100 mm SEMI standard wafer.[2][3]
The system requires nitrogen or CDA at 60–70 PSIG for the labyrinth seal purge, consuming 3 cubic feet per hour. Vacuum of 25–28 inHg with a flow of 4.5 SCFM at 0 inHg is suggested. Power input is 95 to 240 VAC, 47/63 Hz, approximately 300 watts.[1][2][3]
The following facts about the 400-series are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
The control-system platform and OS era of the 400-series are not on record.
Answerable by: an engineer who operated it or OEM installation records
The process node or technology generation of the 400-series is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No publicly documented compatible parts, consumables, or accessories for the 400-series are on record.
Answerable by: an OEM parts catalog or a service engineer
No publicly hosted manuals, SOPs, or datasheets for the 400-series are on record.
Answerable by: university cleanroom staff or an OEM application specialist
Last updated Sep 26, 2026.
The Laurell EDC-HL-23 B is a compact EDC spin processor with capacity for up to 150 mm wafers and 5 in x 5 in substrates.
The Laurell H6-23 is a compact HL Series spin coater for wafers and substrates, with a maximum rotational speed of 12,000 RPM.
The Laurell Lz-23 B is a compact 650-series spin coater that accommodates up to 150 mm wafers and 5 in × 5 in substrates.
The Laurell WS-650 is a spin coater used for spincoating photoresists.