KLA
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The Surfscan 6200 is used on unpatterned wafers, so the tool evaluates surface condition before pattern-dependent inspection steps.[2]
The Surfscan 6200 is used for wafer surface contamination analysis on silicon wafers and other opaque, polished surfaces that scatter less than a small fraction of incident light.[2]
The Surfscan 6200 has been used in defect measurements on coatings deposited by planar magnetron sputtering and on Mo/Si multilayers and silicon films.[5]
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The Surfscan 6200 handles 50 mm, 76 mm, 100 mm, 125 mm, 150 mm, and 200 mm wafers.[2]
The Surfscan 6200 uses a 30 mW argon-ion laser at 488 nm.[2][3]
The Surfscan 6200 provides defect maps, histograms, haze maps, and magnified views of individual defects.[3][2]
The Surfscan 6200 is specified for silicon wafers and for opaque, polished surfaces that scatter less than 5% of incident light.[2]
The following facts about the Surfscan 6200 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the Surfscan 6200 are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the Surfscan 6200 are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the Surfscan 6200 are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the Surfscan 6200 are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the Surfscan 6200 is not on record.
Answerable by: an OEM datasheet or a fab qualification report
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Last updated Sep 28, 2026.