Waferpedia

KLA

6220

KLA 6220 family
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This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.

The KLA 6220 is a particle inspection system. The KLA 6220 is a bare wafer surface defect inspection system. The KLA 6220 uses a 30 mW argon-ion laser at 488 nm.[1][2]

KLA6220
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Performance

100 wph (200 mm) at 0.12 mm[1]

Optics

30 mW argon-ion laser, 488 nm wavelength[1]

What it is

The KLA-Tencor Surfscan 6220 is an unpatterned (bare wafer) surface defect inspection system.[1]

The KLA-Tencor 6220 Surfscan performs non-patterned surface particle measurement.[2]

How it works

The KLA 6220 uses a 30 mW argon-ion laser with a wavelength of 488 nanometers as its illumination source.[1]

Applications

The KLA 6220 is used for bare wafer surface defect inspection on opaque, polished surfaces that scatter less than five percent of incident light.[1]

The KLA 6220 achieves a defect sensitivity of 0.09 micrometer diameter PSL sphere equivalent with a capture rate greater than eighty percent.[1][2]

The throughput specification for the KLA 6220 is 100 wafers per hour at 200 millimeters with 0.12 micrometer sensitivity.[1][2]

What do the numbers mean?

Wafer handling3

Inspection type
Bare wafer surface defect inspection system[1]
Accurate?
Wafer sizes
2", 3", 4", 6", and 8" wafers capable[1]
Accurate?
Wafer sizes
From 4" to 8" wafers[2]
Accurate?

Optics & imaging2

Illumination source
30 mW argon-ion laser, 488 nm wavelength[1]
Accurate?
Sensitivity
90 nm sensitivity, >80% capture rate[2]
Accurate?

Performance1

Throughput
100 wph (200 mm) at 0.12 mm[1]
Accurate?

Configuration & options2

Model
6220[3]
Accurate?
Inspection type
Particle inspection system[1]
Accurate?
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Where are the manuals?

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Not publicly documented

Field notes

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Frequently asked questions

What is the defect sensitivity of the KLA 6220?

The defect sensitivity is 0.09 micrometer diameter PSL sphere equivalent with greater than eighty percent capture rate.[1][2]

What is the throughput of the KLA 6220?

The throughput is 100 wafers per hour at 200 millimeters and 0.12 micrometer sensitivity.[1][2]

What light source does the KLA 6220 use?

The illumination source is a 30 milliwatt argon-ion laser operating at 488 nanometers wavelength.[1]

What type of inspection does the KLA 6220 perform?

The KLA 6220 performs darkfield, non-patterned (bare wafer) surface particle inspection.[2]

Not publicly documented

The following facts about the 6220 are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 6220 are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the 6220 are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the 6220 are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the 6220 are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the 6220 is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

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Sources & citations

Sources (3)Every fact above is drawn from these public sources
  1. [1]classoneequipment.com — classoneequipment.comclassoneequipment.com
  2. [2]gsemi.com — gsemi.comgsemi.com
  3. [3]Equipment inventory listing
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Last updated Oct 3, 2026.

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