Waferpedia

EV Group

810LT

The EV Group 810LT is a low temperature plasma activation system. The EV Group 810LT is used to prepare wafer surfaces before bonding experiments. The EV Group 810LT supports low-power, short-duration nitrogen, oxygen, and argon plasma treatments.[1][2]

810LT — epfl.ch
Fig. 01810LTepfl.ch[2]
  • Plate 01EVG 810LT Plasma Cleaner Demo

    Lithography Equipment SupportWatch on YouTube

What it is

The EV Group 810LT is a low temperature plasma activation system used to prepare wafer surfaces before bonding experiments.[1]

The EV Group 810LT supports low temperature plasma activation with nitrogen, oxygen, or argon process gases. The EV Group 810LT is operated with manual wafer loading and unloading and automated chamber closing and opening.[2][3]

How it works

A plasma activation system exposes the wafer surface to a controlled plasma so the surface can be modified before bonding. The EV Group 810LT offers low power, short-duration plasma treatments using nitrogen, oxygen, or argon.[1]

The EV Group 810LT uses a chamber with a wafer chuck and cover mechanism. The operator loads the wafer into the chamber, closes the cover, starts a recipe in the control software, and monitors the plasma during the process.[1]

Where it fits in the process flow

The EV Group 810LT sits before wafer bonding in the process flow. The EV Group 810LT prepares wafer surfaces for bonding experiments.[1]

Applications

The EV Group 810LT is used for surface activation of wafers before bonding. The EV Group 810LT provides standard plasma treatment programs with nitrogen, oxygen, and argon.[1]

What do the numbers mean?

Wafer handling2

wafer loading/unloading
manual[2]
Accurate?
wafer loading
manual wafer loading/unloading[2]
Accurate?

Gas & chemistry1

process gases
O2, N2, or Ar[2]
Accurate?

Configuration & options4

equipment type
low temperature plasma activation system[2]
Accurate?
chamber operation
automated chamber closing/opening[2]
Accurate?
location
Zone 6[2]
Accurate?
standard plasma treatments
N2, O2, and Ar low-power short-duration plasma[1]
Accurate?
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What does it need to run?

Site utility requirements, footprint, and infrastructure needed to install and operate this tool. Sourced from public records.

  • process gasesO2, N2, or Ar[2]

Where are the manuals?

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Not publicly documented

Field notes

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Frequently asked questions

What type of equipment is the EVG 810LT?

It is a low temperature plasma activation system.[2][3]

How are wafers handled on the EVG 810LT?

Wafer loading and unloading are manual, and chamber closing and opening are automated.[2][3]

Not publicly documented

The following facts about the 810LT are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the 810LT are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the 810LT are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the 810LT are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the 810LT are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • The process node or technology generation of the 810LT is not on record.

    Answerable by: an OEM datasheet or a fab qualification report

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Sources & citations

Sources (3)Every fact above is drawn from these public sources
  1. [1]epfl.ch — epfl.chepfl.ch
  2. [2]epfl.ch — epfl.chepfl.ch
  3. [3]Packaging – Miscellaneous ‒ Center of MicroNanoTechnology CMi ‐ EPFL — epfl.chepfl.ch
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Last updated Oct 3, 2026.