Canon
FPA 5510 iZ i-Line
Provisional entry — research in progress
This page was generated automatically from cited public sources and hasn't completed the full research pass yet. Every specification shown carries its source; more detail is added as research completes.
The Canon FPA 5510 iZ is an i-line stepper. The FPA 5510 iZ processes 12-inch wafers. The FPA 5510 iZ is a wide-field stepper.[1][2]
What it is
How it works
General reference — not yet source-verifiedAfter each exposure, the wafer stage moves to the next die position, and the process repeats until the entire wafer is exposed.
The wide-field capability allows larger die sizes or multiple die to be exposed in a single field, reducing the number of steps required per wafer.
Where it fits in the process flow
General reference — not yet source-verifiedThe system can be employed for critical layers in memory or logic devices where i-line resolution is sufficient, and for non-critical layers in advanced nodes where overlay and resolution requirements are relaxed.
Applications
General reference — not yet source-verifiedThe wide-field capability makes the system suitable for exposing large-area devices, such as image sensors or system-on-chip dies with large reticle fields.
What do the numbers mean?
Wafer handling2
Configuration & options3
- Wide-Field[1]
What replaced it?
Alternatives
Tools documented as functional equivalents — same process step and wafer size, from a different manufacturer. Each equivalence cites its source.
- Nikon NSR SF 155 i-Line— Same function class: Lithography, nullCompare in depthsource[1]
- Nikon SF 130— Same function class: Lithography, nullCompare in depthsource[1]
Where are the manuals?
Generated from public-source data on file. Enter your email to access — nothing is published; details are routed privately.
Not publicly documented
Field notes
No research found yet — worked with this tool? Share what you know.
Frequently asked questions
Not publicly documented
The following facts about the FPA 5510 iZ i-Line are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.
No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the FPA 5510 iZ i-Line are on record.
Answerable by: OEM historical records or a trade-press announcement
No publicly documented variants, configuration options, or revision breakpoints of the FPA 5510 iZ i-Line are on record.
Answerable by: an OEM product catalog or an engineer who ordered or specified the tool
The control-system platform and OS era of the FPA 5510 iZ i-Line are not on record.
Answerable by: an engineer who operated it or OEM installation records
No publicly documented failure modes or field errata for the FPA 5510 iZ i-Line are on record.
Answerable by: a field service engineer, process engineer, or maintenance technician
The process node or technology generation of the FPA 5510 iZ i-Line is not on record.
Answerable by: an OEM datasheet or a fab qualification report
No research found yet — worked with this tool? Share what you know.
Sources & citations
Sources (2)Every fact above is drawn from these public sources
- [1]inventory listing
- [2]Equipment inventory listing
Last updated Oct 11, 2026.
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The Nikon NSR SF 155 is an i-line stepper with a 12-inch wafer size.
The Nikon SF 130 is a lithography stepper with an i-line 365 nm exposure wavelength and support for 200 mm wafer exposure.