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ASML

TWINSCAN NXE:3400C

Lithography7 nm, 5 nmASML TWINSCAN NXE:3400C family
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TWINSCAN NXE:3400C — asml.com
Fig. 01TWINSCAN NXE:3400Casml.com[1]
  • Plate 01EUV lithography in action Inside the TWINSCAN NXE 3400 EUV lithography machine

    Литография СтепперWatch on YouTube

Node / era

7 nm, 5 nm

Optics

13.5 nm (EUV)[1]

What it is

The ASML TWINSCAN NXE:3400C is an extreme ultraviolet (EUV) lithography system. The TWINSCAN NXE:3400C supports volume production at the 7 nm and 5 nm logic nodes.[1]

Where it fits in the process flow

The TWINSCAN NXE:3400C is used to print the most intricate, critical layers of advanced semiconductor chips. In a typical fab flow, the NXE:3400C prints the foundation layers for 7 nm and 5 nm logic nodes, while less critical layers are printed using deep ultraviolet (DUV) lithography systems.[1]

Applications

The TWINSCAN NXE:3400C is designed for high-volume manufacturing of advanced logic and memory chips. Chips produced with EUV lithography enable technologies such as smartphones, gaming consoles, augmented reality, and artificial intelligence.[1]

  • High-volume manufacturing of advanced logic chips at 7 nm and 5 nm nodes

What do the numbers mean?

Optics & imaging4

Light source wavelength
13.5 nm (EUV)[1]
Accurate?
Numerical aperture (NA)
0.33[1]
Accurate?
Resolution
13 nm[1]
Accurate?
Supported nodes
7 nm, 5 nm[1]
Accurate?
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Where are the manuals?

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Not publicly documented

Field notes

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Frequently asked questions

What nodes does the TWINSCAN NXE:3400C support?

The TWINSCAN NXE:3400C supports volume production at the 7 nm and 5 nm logic nodes.[1]

What is the numerical aperture of the NXE:3400C?

The NXE systems, including the NXE:3400C, have a numerical aperture (NA) of 0.33.[1]

What type of light source does the NXE:3400C use?

The NXE:3400C uses an extreme ultraviolet (EUV) light source with a wavelength of 13.5 nm.[1]

Why must the optical path of the NXE:3400C be in a vacuum?

EUV light is absorbed by everything, including air, so the entire light path from source to wafer must be in a high-vacuum environment.[1]

What is the resolution of the NXE lithography systems?

NXE systems print microchip features with a resolution of 13 nm.[1]

What is the reduction factor of the optical column in the NXE systems?

The optical column in NXE systems shrinks the reticle pattern by a factor of four.[1]

Not publicly documented

The following facts about the TWINSCAN NXE:3400C are absent from this record as of this revision. First-hand knowledge or a citation closes a gap; every submission is reviewed before publication.

  • No publicly documented production dates or lifecycle milestones (introduction, end of production, EOL) for the TWINSCAN NXE:3400C are on record.

    Answerable by: OEM historical records or a trade-press announcement

  • No publicly documented variants, configuration options, or revision breakpoints of the TWINSCAN NXE:3400C are on record.

    Answerable by: an OEM product catalog or an engineer who ordered or specified the tool

  • The control-system platform and OS era of the TWINSCAN NXE:3400C are not on record.

    Answerable by: an engineer who operated it or OEM installation records

  • No publicly documented failure modes or field errata for the TWINSCAN NXE:3400C are on record.

    Answerable by: a field service engineer, process engineer, or maintenance technician

  • No publicly documented compatible parts, consumables, or accessories for the TWINSCAN NXE:3400C are on record.

    Answerable by: an OEM parts catalog or a service engineer

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Sources & citations

Sources (1)Every fact above is drawn from these public sources
  1. [1]asml.com — asml.comasml.com
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Last updated Sep 22, 2026.

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