Tool family
Oxford Instruments Plasmalab 100 ICP 180 ICP-RIE
Models in this family
The Oxford Plasmalab 100 ICP 180 is an inductively coupled plasma reactive ion etch system for 2 inch wafers.
Tool family
The Oxford Plasmalab 100 ICP 180 is an inductively coupled plasma reactive ion etch system for 2 inch wafers.
