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Comparison ledger

3303 Lift Offversus3305

Veeco 3303 Lift Off, Veeco 3305, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
3305Veeco
OEMVeecoVeeco
Category—Wet Processing / Clean
Wafer size—Single Wafer (LOP)
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyVeeco 33xxVeeco 33xx
Specifications
HPC solvent lift off process500-2300 PSI1)[1]—
ConfigurationHVS (High Velocity Spray) Chamber up to 40 PSI[1]30 Amp[3]
Model3303[1]—
Machine typeLift Off Machine[1]—
Wafer size6 inch[1]Single Wafer (LOP)[3]
ProcessHPC solvent lift off process[1]—
Process pressure500-2300 PSI[1]—
Chamber pressureup to 40 PSI[2]—
Voltage—415 Vac[3]
Phase—3 Phase[3]
Frequency—50 Hz[3]
Category—Wet Processing / Clean[4]
Current—30 Amp[3]
Vintage—2010[3]
Sources (4)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]waferpedia.comwaferpedia.com
  3. [3]inventory listing
  4. [4]waferpedia.comwaferpedia.com