Comparison ledger
Varian EHPI 500, Varian EHPI 500 Medium Current, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | EHPI 500Varian | EHPI 500 Medium CurrentVarian |
|---|---|---|
| OEM | Varian | Varian |
| Category | Ion Implantation | Ion Implantation |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | 2001 Vintage |
| Control system | — | — |
| Generation | — | — |
| Family | Varian EHPI 500 | Varian EHPI 500 |
| Specifications | ||
| Configuration | Medium Current[1] | 5 Wire[6] |
| Tool type | Medium current ion implanter[2] | Medium current implanter[7] |
| Energy range (single charge, X+) | 5 – 260 keV[2] | — |
| Energy range (extended) | up to 780 keV[2] | — |
| Maximum wafer size | 200 mm (8 in)[2] | — |
| Minimum feature size | 0.18 µm[2] | — |
| Throughput | Highest industry throughput among medium current implanters (10% higher maximum throughput than previous E-series)[2] | — |
| Upgrade / Extensions | BDM (Beam Drift Monitors)[3] | — |
| Consumables at end of lifetime | source electrode[3] | — |
| Contamination Known | BF3, ASH 3, PH 3[3] | — |
| Energy range | up to 780 keV[2] | — |
| Wafer size | up to 200 mm[2] | 8 inch[6] |
| Throughput increase | 10% higher maximum throughput[2] | — |
| Manufacturer | Varian[4] | — |
| Model | EHPI 500[4] | EHPI 500[6] |
| Equipment type | Implanter[4] | — |
| Process class | Medium current ion implanter[1] | — |
| Expanded energy range | up to 780 keV[2] | — |
| Maximum throughput change | 10% higher maximum throughputs[2] | — |
| Feature size capability | down to 0.18 micron[2] | — |
| Wafer size capability | up to 200mm[2] | — |
| Phase | — | 3 Phase[6] |
| OEM | — | Varian[6] |
| Application | — | Ion implantation[7] |
| Power | — | 3 Phase[6] |
| Electrical configuration | — | 5 Wire[6] |
| Line frequency | — | 50/60 Hz[6] |
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