Waferpedia

Comparison ledger

MJB 3 Maskversus1000 Family

SUSS MicroTec MJB 3 Mask, Ultratech 1000 Family, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
MJB 3 MaskSUSS MicroTec
1000 FamilyUltratech
OEMSUSS MicroTecUltratech
CategoryLithographyLithography
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilySUSS MicroTec MJBUltratech 1000 Family
Specifications
ConfigurationRefurbished[1]—
Power350W lamphouse with Ushio USH-350DS Hg lamp[2]—
Wafer size3 inch[2]—
Lamp350W lamphouse with Ushio USH-350DS Hg lamp[2]—
Optics typeUV400 near UV optics, 350-450 nm[2]—
Resolution0.6 µm[2]—
MicroscopeSplitfield microscope with Leica objectives 3.5x/10x/20x[2]—
Vacuum chuck size3 inch[2]—
Mask holder size3x3 inch[2]—
Tool type—Photolithography step-and-repeat 1X stepper[3]
Optical design—Wynne Dyson[3]
Magnification—1X[3]

Plan your fab

Building a Lithography process? Get a complete equipment list.

Open the fab equipment planner →
Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing
  3. [3]en.wikipedia.orgen.wikipedia.org