Comparison ledger
Oxford Instruments Plasmalab 80 Plus RIE-PECVD, Tegal 1512e, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Plasmalab 80 Plus RIE-PECVDOxford Instruments | 1512eTegal |
|---|---|---|
| OEM | Oxford Instruments | Tegal |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Oxford Instruments Plasmalab 80 | Tegal 1512e |
| Specifications | ||
| Dual Chamber (Chamber A | PECVD & Chamber B: RIE)[1] | — |
| Configuration | It has some problems. It was setup with PC interface and it appears to have lost signals for RF power, pressure and chamber switch was erratic.[1] | — |
| Power Supply Upgrade | ENI Power Supply upgraded to MKS[1] | — |
| Tool type | — | Industrial RIE plasma etcher system[2] |
| Stated configuration | — | With modules assembly for CI-4222[2] |
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