Comparison ledger
OAI 806 Mask, Ultratech 1000 Family, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 806 MaskOAI | 1000 FamilyUltratech |
|---|---|---|
| OEM | OAI | Ultratech |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | OAI 806 Mask | Ultratech 1000 Family |
| Cited variants |
| — |
| Specifications | ||
| Wafer size | 6 inch[2] | — |
| Model | 806[2] | — |
| Model variant | MBA 806[1] | — |
| Alignment accuracy | submicron[3] | — |
| Light source | collimated UV light source, 350W NUV lamphouse[3] | — |
| Workholding | vacuum chuck[3] | — |
| Microscope | integrated microscope optics with 5x objectives[3] | — |
| Stage | motorized stage with Thomson Industries Quickslide System[1] | — |
| Contact modes | soft, hard, and proximity contact[3] | — |
| Backside alignment | optional[3] | — |
| Wafer loading | manual[1] | — |
| Mask holders | 4 inch (3 inch round opening), 5 inch (4 inch round opening), 7 inch (6 inch round opening)[1] | — |
| BSA chucks | 3 inch, 4 inch, and 6 inch[1] | — |
| OEM | OAI[2] | — |
| Tool type | Mask Aligner[2] | Photolithography step-and-repeat 1X stepper[4] |
| Exposure modes | soft contact, hard contact, and proximity contact modes[3] | — |
| Optical source | collimated UV light source[3] | — |
| Alignment optics | integrated microscope optics[3] | — |
| Model designation | MBA806[1] | — |
| Manual wafer load | manual wafer load mask aligner[1] | — |
| Lamphouse | 350W NUV lamphouse[1] | — |
| Microscope light power supply | included[1] | — |
| Objectives | 5x objectives[1] | — |
| System | Thomson Industries Quickslide System[1] | — |
| Optical design | — | Wynne Dyson[4] |
| Magnification | — | 1X[4] |
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