Waferpedia

Comparison ledger

120 ContinuousversusTenuPol-5

Lapmaster 120 Continuous, Struers TenuPol-5, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
TenuPol-5Struers
OEMLapmasterStruers
CategoryCMPCMP
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyLapmaster 120 ContinuousStruers TenuPol-5
Specifications
Equipment type—Electropolishing[1]
Function—Prepares TEM sections of electrically conductive materials through electrolytical thinning[1]
Polishing voltage range—0-100 V (0.1 V steps)[2]
Polishing current—2.5 A[2]
Electrolyte container capacity—approximately 1 liter[3]
Recommended electrolyte temperature range—-50°C to +45°C (-58°F to +113°F)[3]
Pump flow rate range—0-50 (arbitrary units)[3]
Specimen disc diameters (pre-thinning)—10 mm[3]
Specimen disc diameters (final thinning)—3 mm[3]
Light stop detection—Auto or ignore[3]
Flow modes—Single flow, Dual flow step, Dual flow ramp[3]
Output voltage (polishing)—0-100 V (0.1 V steps)[2]
Output current (polishing)—2.5 A[2]
Width—270 mm (10.6")[2]
Depth—180 mm (7.1")[2]
Height—276 mm (10.9")[2]
Weight—3.8 kg (8.4 lbs)[2]
Operating temperature—5-40°C (41-104°F)[2]
Operating humidity—0-95 % RH non-condensing[2]
Storage temperature—-25-55°C (13-113°F)[2]
Storage humidity—0-95 % RH non-condensing[2]
Noise level—LpA = 55.4 dB(A) (measured value), Uncertainty K = 4 dB[2]

Plan your fab

Building a CMP process? Get a complete equipment list.

Open the fab equipment planner →
Sources (3)Every fact above is drawn from these public sources
  1. [1]snsf.stanford.edusnsf.stanford.edu
  2. [2]webshopcms.struers.comwebshopcms.struers.com
  3. [3]manualslib.commanualslib.com