Comparison ledger
Lam Research Rainbow 4520 Oxide, Tegal 1512e, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Rainbow 4520 OxideLam Research | 1512eTegal |
|---|---|---|
| OEM | Lam Research | Tegal |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Lam Research Rainbow 4520 Oxide | Tegal 1512e |
| Cited variants |
| — |
| Specifications | ||
| Model | Rainbow 4520[2] | — |
| Wafer Size | 6 inch[1] | — |
| Vintage | 1996[3] | — |
| Wafer Size Range Minimum | 150 mm[4] | — |
| Wafer Size Range Maximum | 200 mm[4] | — |
| Set Size | 200 mm[4] | — |
| Software Revision Level | E1.7-024[4] | — |
| Power Requirements | 208 V, 50.0 A, 50/60 Hz[4] | — |
| Weight | 1,764 lb (800 kg)[4] | — |
| Exterior Dimensions | 47.244 in (120.0 cm) W x 98.425 in (250.0 cm) D x 66.929 in (170.0 cm) H[4] | — |
| Manufacturer | Lam Research[2] | — |
| Category | Etch[2] | — |
| Wafer Configuration | 8" (200mm) SEMI[5] | — |
| Features | Single wafer etching; wafer temperature control; variable gap spacing; parallel plate reactor; inductive RF auto tuning; simple and efficient design[6] | — |
| Applications | Contact Etch; Planarization; Via Etch; Trench Mask Etch; Pad Etch[6] | — |
| Tool type | — | Industrial RIE plasma etcher system[7] |
| Stated configuration | — | With modules assembly for CI-4222[7] |
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