Comparison ledger
Lam Research Concept One, Lam Research Concept One TEOS, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Concept OneLam Research | Concept One TEOSLam Research |
|---|---|---|
| OEM | Lam Research | Lam Research |
| Category | Deposition | Lab & Support Equipment |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Lam Research Concept One | Lam Research Concept One |
| Cited variants | — | |
| Specifications | ||
| Configuration | Nitride / TEOS[1] | Flow Box Inside[7] |
| Phase | 3 Phase[1] | — |
| Voltage | 208V Vac[1] | — |
| Host Interface | SECS-[6] | — |
| Gas Box Type | External[6] | — |
| EMO's | Push Button[6] | — |
| One Arm Robot | Lift, Rotate Motor[6] | — |
| Wafer size 6 inch | 6 inch[1] | — |
| Wafer size 8 inch | 8 inch[2] | — |
| Process types | Nitride, TEOS, TEOS-R[1] | — |
| Power requirements | 208V, 50/60 Hz, 3 Phase[1] | — |
| Vintage year | 2012[2] | — |
| Processes | Nitride, TEOS[1] | — |
| Wafer size | 6 inch[1] | — |
| Power supply | 208V, 50/60 Hz, 3-phase[1] | — |
| Vintage (example unit) | 2012[2] | — |
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