Comparison ledger
KLA OP 7341 XP Film Thickness Measurement, SUSS MicroTec 150 e Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 150 e MaskSUSS MicroTec | |
|---|---|---|
| OEM | KLA | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | 25 wafer load ports (Asyst) with robot transfer (2 paddies) | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | KLA OP | SUSS MicroTec 150 e Mask |
| Specifications | ||
| Configuration | CD (1D & 2D features) & film stack measurement[1] | — |
| Wafer size | 25 wafer load ports (Asyst) with robot transfer (2 paddies)[1] | — |
| Software | UNT 6.0[1] | — |
| OEM | KLA / Therma-wave[1] | — |
| Model | OP 7341 XP[1] | — |
| Measurement functions | CD (1D & 2D features) & film stack measurement[1] | — |
| Alignment | Prealigner & full alignment using Vision Processing[1] | — |
| Computing | External Server SuperGrendel for fast computation (168 cores)[1] | — |
| Load ports | 25 wafer load ports (Asyst) with robot transfer (2 paddies)[1] | — |
| Environment | Integrated Mini-Environment[1] | — |
| Measurement chamber | Separated optical table design[1] | — |
| Motion isolation | Pneumatic floating system ensuring no vibration for both stage and optics tables[1] | — |
| User interfaces | Two user interface (Front & Read)[1] | — |
| Communication | SECS / GEM full capability[1] | — |
| Auto-focus | Included[1] | — |
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