Comparison ledger
KLA 2800, KLA .498 PSL Wafer, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 2800KLA | |
|---|---|---|
| OEM | KLA | KLA |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | KLA 2800 | KLA .498 PSL Wafer |
| Specifications | ||
| Configuration | SMAC board[1] | NIST Traceable[5] |
| Inspection type | Broadband brightfield DUV/UV/VIS[4] | — |
| Wavelengths | Multiple wavelengths (DUV/UV/VIS)[4] | — |
| Design rule support | Sub-65-nm (extends to 45-nm and beyond)[4] | — |
| Throughput improvement | 2X better than previous-generation DUV tool[4] | — |
| Optical modes | Array of optical modes for optimal sensitivity per layer/design/process[4] | — |
| Defect classification | Advanced binning and realtime defect classification[4] | — |
| Sensitivity and contrast | Maximum sensitivity and best material contrast for critical defects across all layers[4] | — |
| NIST traceability | — | Yes[5] |
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