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Comparison ledger

1305 BSG 3versusSU 3200

Hitachi 1305 BSG 3, SCREEN SU 3200, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
1305 BSG 3Hitachi
SU 3200SCREEN
OEMHitachiSCREEN
CategoryWet Processing / CleanWet Processing / Clean
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyHitachi 1305 BSG 3SCREEN SU 3200
Specifications
Configuration—Chemicals Used: - H3PO4 (Phosphoric Acid) - IPA (Isopropyl Alcohol) - H2O2 (Hydrogen Peroxide) - TM-Y Chemical Tanks / Channels: - 12 channels FOUP Ports: - 4[1]
Make—SCREEN / DNS[1]
Model—SU 3200[1]
Tool type—single-wafer cleaner[2]
Wafer size—12 inch (300 mm)[3]
Maximum throughput—up to 800 wafers per hour[3]
Maximum chambers—up to 12 chambers[3]
Chamber arrangement—12 chambers in four three-level towers[3]
Wafer handler—Kawasaki robot[3]
Chemical supply system—dynamic direct injection (DDI) or cabinet-type chemical supply system[3]
Communication protocol—SECS/GEMS[3]
Software version—P2485STD00V2485STD00[3]
Power rating—208AC-3 Phase[3]
Chemicals used—H3PO4 (Phosphoric Acid), IPA (Isopropyl Alcohol), H2O2 (Hydrogen Peroxide), TM-Y[1]
Chemical tanks / channels—12 channels[1]
FOUP ports—4[1]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]waferpedia.comwaferpedia.com
  3. [3]waferpedia.comwaferpedia.com