Waferpedia

Comparison ledger

Integrity-20versusIntegrity-29

Denton Vacuum Integrity-20, Denton Vacuum Integrity-29, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
Integrity-20Denton Vacuum
Integrity-29Denton Vacuum
OEMDenton VacuumDenton Vacuum
CategoryOphthalmic coating systemOphthalmic coating system
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control systemWindows based—
Generation——
FamilyDenton Vacuum Integrity-20Denton Vacuum Integrity-29
Cited variants
  • Integrity 20[1]
—
Specifications
ModelIntegrity-20[1]—
System typeOphthalmic AR coating system[1]—
PositioningCompact, economical, easy to operate[1]—
AutomationTouch and Coat Automation[1]—
Control softwareWindows-based operating software[1]—
Deposition methodIon-Assisted Deposition[1]—
ProcessGlareban AR coating process[1]—
FixturingFast-Flip fixturing[1]—
Coating chamber size20" x 24" x 28"[1]—
Deposition source capacity16 lenses (70 mm uncut lens)[1]—
Cycle time48 min./Both sides[1]—
System size48" x 77" x 30"[1]—
Vacuum chamber material—304 stainless steel[2]
Vacuum chamber dimensions—29 in wide x 29 in deep x 32 in high[2]
Vacuum chamber door—Full-width front door with two-point articulating hinges and Viton O-ring seal[2]
System cabinets—Two stand-alone NEMA 12 enclosures[2]
Pumping system—APD-10SC cryogenic pump with APD Displex water-cooled compressor and Alcatel 2063 two-stage rotary vane mechanical pump[2]
Additional vacuum cooling—Polycold PFC330ST cryogenic cooler[2]
Vacuum gauging controller—Granville-Phillips GP307 ionization/convectron gauge controller[2]
Process gas control—Two MKS 2179 mass flow controllers, each capable of 0-100 sccm in fixed flow mode[2]
Substrate rotation—Direct drive, single rotation fixture with bearing-supported feedthrough and 1.0 in diameter shaft[2]
Substrate heater—One 3 kW radiant quartz heater assembly[2]
Ion source—Denton Vacuum CC-105 cold cathode ion source[2]
Electron beam evaporation source—TFI-Telemark TFI-261-06 six-pocket rotary crucible electron beam source[2]
Electron beam power supply—TFI-Telemark ST-4 4.0 kW electron beam gun power supply[2]
Low voltage resistance source power supply—Denton Vacuum 4.0 kW two-position A/B low voltage resistance evaporation power supply[2]
Deposition controller—Inficon XTC/2 quartz crystal controller with single crystal sensor[2]
System computer—Hewlett Packard Vectra PC with 586 microprocessor and 17 in SVGA monitor[2]
Control software interface—GE Cimplicity software via RS-485 interface to a GE Fanuc 9030 PLC[2]

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Sources (2)Every fact above is drawn from these public sources
  1. [1]web.archive.orgweb.archive.org
  2. [2]web.archive.orgweb.archive.org