Waferpedia

Comparison ledger

100 SpinversusH6-15 B

CEE 100 Spin, Laurell H6-15 B, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
H6-15 BLaurell
OEMCEELaurell
CategoryResist ProcessingResist Processing
Wafer size—300mm
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyCEE 100Laurell H6-15 B
Specifications
ConfigurationVolts 115[1]—
Model—H6-15 B[2]
Type—Spin Coater[2]
Controller—650-series[2]
Max. Substrate Size—300mm (9" x 9")[2]
Max. RPM—12000 rpm[2]
Mounting Options—Tabletop, In-Deck, On-deck[2]

Plan your fab

Building a Resist Processing process? Get a complete equipment list.

Open the fab equipment planner →
Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]images.laurell.comimages.laurell.com