Comparison ledger
CEE 100, Tokyo Electron Mark 8, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 100CEE | Mark 8Tokyo Electron |
|---|---|---|
| OEM | CEE | Tokyo Electron |
| Category | Lithography | Lithography |
| Wafer size | 6" | Parallel wafer flow processing software option (simultaneous coat & develop) |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | 1992 Vintage · 1993 Vintage · 1996 Vintage · 1998 Vintage |
| Control system | — | — |
| Generation | — | — |
| Family | CEE 100 | Tokyo Electron Mark |
| Cited variants |
| |
| Specifications | ||
| Tool type | Spray Developer[1] | — |
| Accepts wafer size | up to 6" wafers[7] | — |
| Programmable programs | 10 programs[7] | — |
| Steps per program | up to 10 steps[7] | — |
| Programmable step parameters | Acceleration, Speed, Time[7] | — |
| Associated document | CEE Model 100CB Spinner.doc[7] | — |
| Wafer size | Up to 6 inches[7] | Parallel wafer flow processing software option (simultaneous coat & develop)[5] |
| Programs | 10 programs each with up to 10 steps[7] | — |
| Control parameters | Acceleration, Speed, Time[7] | — |
| Configuration | — | SOGT[4] |
| Wafer Size | — | 6 inch, 8 inch[2] |
| Configurations | — | Developer, Coater, Coater/Developer[2] |
| Vintages | — | 1992, 1993, 1996, 1998[3] |
| Coater/Developer Configuration Details | — | 2 coater / 2 developer - Cassette platforms (4) - Coat Modules (2) - Hot Plates (8) - Chill Plates (9) - Wash Disk system (WDS) - A two block system / two robots - Parallel wafer flow processing software option (simultaneous coat & develop) - Semifab CD 200+4TEL Temperature & Humidity Unit - Chemical cabinet containing SMC INR-244-117B Thermocons[5] |
| Make | — | Tel[5] |
| Model | — | Mark 8[5] |
| Wafer sizes | — | 6 inch[3] |
| Cassette platforms | — | 4[5] |
| Coat modules | — | 2[5] |
| Hot plates | — | 8[5] |
| Chill plates | — | 9[5] |
| Wash disk system | — | WDS[5] |
| Robots | — | 2[5] |
| Software option | — | Parallel wafer flow processing software option (simultaneous coat & develop)[5] |
| Temperature & humidity unit | — | Semifab CD 200+4TEL Temperature & Humidity Unit[5] |
| Chemical cabinet contents | — | SMC INR-244-117B Thermocons[5] |
| Bulk developer chemical mix station | — | Available for this system[5] |
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