Comparison ledger
Canon FPA 3000 i 5 ++ i-Line, Nikon SF 130, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | SF 130Nikon | |
|---|---|---|
| OEM | Canon | Nikon |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Canon FPA 3000 | Nikon SF 130 |
| Cited variants | — | |
| Specifications | ||
| Configuration | Refurbished to run 150mm Saphhire (2017)[3] | With:[4] |
| Exposure wavelength | i-line[1] | — |
| Wafer size | 8 inch[1] | — |
| Type | i-Line Stepper[1] | — |
| Make | Canon[1] | — |
| Model | FPA 3000 i 5 ++[1] | SF 130[4] |
| Operating System | — | Windows[4] |
| Manufacturer | — | Nikon[4] |
| Category | — | Lithography[5] |
| Light Source | — | i-line mercury lamp (365 nm wavelength)[6] |
| Exposure Wavelength | — | 365 nm[7] |
| Max Wafer Size | — | 200 mm[7] |
| Numerical Aperture | — | ~0.50[7] |
| Throughput | — | about 100 wafers per hour[7] |
| Common Process Node | — | ≥ 0.25 μm[7] |
| Tool type | — | lithography stepper[5] |
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