Comparison ledger
Axcelis 200 ACU, Lam Research AutoEtch 590, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 200 ACUAxcelis | AutoEtch 590Lam Research |
|---|---|---|
| OEM | Axcelis | Lam Research |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Axcelis NV GSD 200 | Lam Research AutoEtch 590 |
| Specifications | ||
| Configuration | Parts Machine[1] | Cassette-to-cassette automatic plasma etching platform[5] |
| Manufacturer | Axcelis[1] | — |
| Model | 200 ACU[1] | AutoEtch 590[6] |
| Tool type | Asher[1] | — |
| Wafer size | 200mm[3] | 4"~6"[5] |
| Serial number | AU6A356AH[3] | — |
| Computer system | M 200 PC, M 200[4] | — |
| Part number | SC 4572 A[4] | — |
| Volts | 208[4] | — |
| Amps | 30[4] | — |
| Equipment type | Asher[1] | Etcher[6] |
| Wafer configuration | 8 inch[2] | — |
| Chamber structure | — | Double airlock chamber structure[5] |
| Plasma configuration | — | Parallel plate plasma etching configuration[5] |
| Wafer handling | — | Automatic cassette-to-cassette wafer handling; single wafer plasma etch processing platform[5] |
| Control system | — | Upgraded Allwin21 PC controller and touchscreen monitor[5] |
| Programmable parameters | — | RF power, chamber pressure, gas flow control, electrode spacing, multi-step process recipes[5] |
| OEM | — | Lam Research[6] |
| Process platform | — | Single wafer plasma etch processing platform[5] |
| Control interface | — | Allwin21 upgraded PC controller and industrial touchscreen monitor interface[5] |
| Process parameters | — | Programmable RF power, chamber pressure, gas flow control, electrode spacing, and multi-step process recipes[5] |
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