Waferpedia

Comparison ledger

Twinscan XT 1700 Fi ArFversusTwinscan XT 1700 i Immersion

ASML Twinscan XT 1700 Fi ArF, ASML Twinscan XT 1700 i Immersion, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMASMLASML
CategoryLithographyLithography
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyASML Twinscan XT 1700ASML Twinscan XT 1700
Specifications
ConfigurationSMIF / FOUP[1]193nm[3]
Excimer LaserCymer XLA 360[1]—
Wafer Size12 inch (300 mm)[1]—
Wafer InterfaceSMIF / FOUP[2]—
Vintage2006[1]2006[3]
Type—Immersion scanner[3]
Wavelength—193 nm[3]
Node—45 nm[3]
Throughput—122 wafers per hour[3]

Plan your fab

Building a Lithography process? Get a complete equipment list.

Open the fab equipment planner →
Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]waferpedia.comwaferpedia.com
  3. [3]inventory listing