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Comparison ledger

PAS 5500 1150 C Waferversus150 e Mask

ASML PAS 5500 1150 C Wafer, SUSS MicroTec 150 e Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
150 e MaskSUSS MicroTec
OEMASMLSUSS MicroTec
CategoryLithographyLithography
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyASML PAS 5500SUSS MicroTec 150 e Mask
Specifications
Configuration2x2 cassette/transfer loader[1]—
Wafer size8 inch[1]—
CategoryLithography[2]—
Laser systemCymer NL7600A NanoLith laser system, 400V, 70A, mfg 2002[1]—
Wafer loader2x2 cassette/transfer loader[1]—
Mains power cabinetMains power cabinet[1]—
Filtration unitDonaldson P199100 LithoGuard filtration unit[1]—
Exhaust blowerRietschle Thomas SAH 55 (10) exhaust blower[1]—
Exhaust blower cabinetRietschle Thomas REL 44050 (23) exhaust blower cabinet[1]—
Uninterruptible power systemQuality Power Solutions uninterruptible power system w/ battery pack[1]—
Power conditionerPowervar ABC75.0-48D40Y 2000 Series GPI power conditioner, 75kVA[1]—

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Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]waferpedia.comwaferpedia.com