Comparison ledger
Applied Materials Centura DPS Poly, Axcelis 200 ACU, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Centura DPS PolyApplied Materials | 200 ACUAxcelis |
|---|---|---|
| OEM | Applied Materials | Axcelis |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials Centura DPS Poly | Axcelis NV GSD 200 |
| Cited variants |
| — |
| Specifications | ||
| Wafer Size | 6 inch[2] | — |
| Tool Type | Poly Etcher[2] | — |
| Plasma Source Type | Decoupled Plasma Source (DPS)[1] | — |
| RF Pulsing Frequency | 1 kHz to 5 kHz[1] | — |
| Chamber Coating Material | Alumina or Y2O3[1] | — |
| Supported Process Node | 28 nm[1] | — |
| Configuration | — | Parts Machine[3] |
| Manufacturer | — | Axcelis[3] |
| Model | — | 200 ACU[3] |
| Tool type | — | Asher[3] |
| Wafer size | — | 200mm[5] |
| Serial number | — | AU6A356AH[5] |
| Computer system | — | M 200 PC, M 200[6] |
| Part number | — | SC 4572 A[6] |
| Volts | — | 208[6] |
| Amps | — | 30[6] |
| Equipment type | — | Asher[3] |
| Wafer configuration | — | 8 inch[4] |
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