Waferpedia

Comparison ledger

0020 12458 Partversus80 Plus

Applied Materials 0020 12458 Part, Oxford Instruments 80 Plus, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0020 12458 PartApplied Materials
80 PlusOxford Instruments
OEMApplied MaterialsOxford Instruments
CategoryDepositionDeposition
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0020 12458 PartOxford Instruments 80 Plus
Specifications
ConfigurationInsulator,Side Match,Hdp-Cvd Ultima Plus[1]50/60 Hz[2]
Asset number146526[1]—
MakeApplied Materials[1]—
Model0020 12458[1]—
Phase—3 Phase[2]
Voltage—415 vAC[2]
Process type—Plasma-enhanced chemical vapor deposition (PECVD)[3]
Maximum wafer size—8 inches (200 mm)[3]
Maximum temperature—400 °C[3]
RF generator power—300W at 13.56 MHz[3]
Available gases—SiH4, NH3, N2O, N2, O2, CF4[3]
Total gas flow range—150 – 3000 sccm[3]
Pressure range—200 – 2000 mTorr[3]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing
  3. [3]aggiefab.tamu.eduaggiefab.tamu.edu