Comparison ledger
Applied Materials 0010-13622 RF Match for, SPTS Sigma FxP, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-13622 RF Match forApplied Materials | Sigma FxPSPTS |
|---|---|---|
| OEM | Applied Materials | SPTS |
| Category | Deposition | Deposition |
| Wafer size | — | Mk1 3 KW lamp (provide wafer heating) |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | 2010– |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-13622 RF Match for | SPTS Sigma |
| Specifications | ||
| Configuration | High Efficiency HE RF Match-Bias[1] | Includes:[2] |
| Model | 0010-13622[1] | — |
| Product Type | RF Match for PVD (Physical Vapor Deposition)[1] | — |
| Feature | High Efficiency HE RF Match-Bias[1] | — |
| Wafer | — | 8" compatible[2] |
| Phase | — | Power Box (415 VAC, 3 Phase)[2] |
| Station 1 | — | Vacuum Cassette Handler (VCH)[2] |
| Station 2 | — | Pre Heat Chamber[2] |
| Wafer size | — | Mk1 3 KW lamp (provide wafer heating)[3] |
| Station 3 | — | W Dep Chamber[2] |
| Process type | — | PVD (Physical Vapor Deposition)[2] |
| Category | — | Deposition[3] |
| Power Box | — | 415 VAC, 3 Phase[2] |
| Power supplies | — | PSU Power Supplies[2] |
| Vacuum / pumping | — | Cryo Compressors[3] |
| Station 4 | — | Ti / TiN Dep chamber with titanium target (Ti 4N5), MDX II Advanced Energy 15 KW DC power supply, standard speed magnetron drive assembly, platen temp 40°C, onboard CTI 8F cryo pump model 8116065 G 001, argon delivery through a 300 sccm N2 calibrated MFC, nitrogen delivery through a 300 sccm N2 calibrated MFC, Advanced Energy RFX-600 13.56 MHz RF generator, base pressure <7E-8 Torr[2] |
| Station 5 | — | Soft Sputter Etch Chamber with Advanced Energy RFX-600 13.56 MHz RF generator for platen RF, Aviza LF24 350 KHz RF generator for coil RF, argon delivery through 30 sccm N2 calibrated MFC, onboard CTI 8F cryo pump model 8116065 G 001, Aviza Silicon oil chiller to control wafer temp on the pedestal, base pressure <7-8 Torr[2] |
| Station 6 | — | Vacuum Cassette Handler (VCH)[2] |
| Temperature | — | Platen temperature 40°C[2] |
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