Comparison ledger
Applied Materials 0010-13622 RF Match for, Perkin Elmer 2400 8 L, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-13622 RF Match forApplied Materials | 2400 8 LPerkin Elmer |
|---|---|---|
| OEM | Applied Materials | Perkin Elmer |
| Category | Deposition | Deposition |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-13622 RF Match for | Perkin Elmer 2400 |
| Specifications | ||
| Configuration | High Efficiency HE RF Match-Bias[1] | RF 20S power supply[2] |
| Model | 0010-13622[1] | — |
| Product Type | RF Match for PVD (Physical Vapor Deposition)[1] | — |
| Feature | High Efficiency HE RF Match-Bias[1] | — |
| Type | — | Sputtering system[3] |
| Category | — | Deposition[3] |
| Power & electrical | — | RF 20S power supply[3] |
| Configuration & options | — | Four target system[3] |
| Wafer handling | — | Includes a load lock[3] |
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