Waferpedia

Comparison ledger

0010-03485 Magnet Assyversus9500 XR 200 S

Applied Materials 0010-03485 Magnet Assy, Applied Materials 9500 XR 200 S, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-03485 Magnet AssyApplied Materials
9500 XR 200 SApplied Materials
OEMApplied MaterialsApplied Materials
Category——
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-03485 Magnet AssyApplied Materials PI 9500
Specifications
ConfigurationWP AL 300mm PVD[1]50/60 Hz[5]
OEMApplied Materials[1]—
Model0010-03485[1]—
DescriptionMAGNET ASSY, WP AL 300MM PVD[2]—
ProcessPVD[3]—
Wafer size300mm[4]—
VersionSpares[4]—
Part Number0010-03485[1]—
ManufacturerApplied Materials[1]—
Process TypePVD (Physical Vapor Deposition)[1]—
Application (Material)Aluminum (AL)[1]—
Wafer Diameter (associated)300 mm[1]—
Phase—3 Phase + Neutral[5]
Voltage—208 V[5]
CPU—MVME162-P244LSE[5]
Software—4.06[5]
BF3—SDS[5]
PH3—SDS[5]
AsH3—SDS[5]
SiF4—SDS[5]
Argon—External Feed[5]
Chamber—CT-10 Cryos[5]
Source Turbo—STP-1000C[5]
Mrs Turbo—STP-361C[5]
Source Backing—QDP40[5]
Wafer Loader—QDP80 w/ EH500 Blower[5]
Source Type—IHC[5]
Oven Capabilities—Oven fitted to source[5]
Wafer Sizes—6 inch[5]
Power—3 Phase + Neutral - 50/60 Hz - 208 V[5]
Gas Box Gases—BF3: SDS, PH3: SDS, AsH3: SDS, SiF4: SDS, Argon: External Feed[5]
Enlarged Chamber—Yes[5]
Source Magnet—40A[5]
Extraction—Dual Bellows 60kV[5]
Post Acell—160kV max[5]
Total Energy—200kV max[5]
Plasma Flood Gun—HDPFS[5]
Wheel—Direct Drive[5]
Tilt—0 to 7[5]
Orient—fitted, not in use[5]
Flat Not Found Sensor—fitted, not in use[5]
Gripper—Hollow[5]
Wafer on Gripper Sensor—2000 Vintage[5]
Sources (5)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]semistarcorp.comsemistarcorp.com
  3. [3]layla-ec.comlayla-ec.com
  4. [4]fabsurplus.comfabsurplus.com
  5. [5]inventory listing