Comparison ledger
Applied Materials 0010-03254 E Chuck, SUSS MicroTec Labspin 6 Photoresist Spinner, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03254 E ChuckApplied Materials | Labspin 6 Photoresist SpinnerSUSS MicroTec |
|---|---|---|
| OEM | Applied Materials | SUSS MicroTec |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | — | SUSS MicroTec Labspin 6 Photoresist Spinner |
| Cited variants | — | |
| Specifications | ||
| Maker | — | SUSS[2] |
| Model | — | Labspin 6[2] |
| Equipment type | — | Photoresist Spinner[2] |
| Process type | — | manual coater/developer[1] |
| Applications | — | laboratory and R&D[1] |
| Supported wafer sizes | — | 4 inch, 6 inch[2] |
| LabSpin6 substrate size | — | up to 150 mm round or 4" square substrates[1] |
| Max spin speed | — | 8,000 rpm +/- 1 rpm (with 200 mm chuck)[1] |
| Max acceleration | — | 4,000 rpm/s[1] |
| Recipes | — | 200 max[1] |
| Process steps | — | 40 max[1] |
| Programmable step time | — | 1-999 s[1] |
| Controller | — | touch panel with color display[1] |