Waferpedia

Comparison ledger

0010-03254 E ChuckversusCentura 5200 DXZ

Applied Materials 0010-03254 E Chuck, Applied Materials Centura 5200 DXZ, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-03254 E ChuckApplied Materials
Centura 5200 DXZApplied Materials
OEMApplied MaterialsApplied Materials
Category——
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
Family—Applied Materials Centura 5200 DXZ
Cited variants—
  • Centura 5200 DxZ PECVD[1]
  • Centura 5200 DxZ SACVD[2]
Specifications
Wafer Size—200 mm[1]
Process Type (available)—PECVD, SACVD[1]
Number of Chambers (SACVD variant)—3[2]
Chemistry (SACVD variant)—TEOS[2]
OEM—Applied Materials[3]
Model—Centura 5200 DXZ[3]
Description—PECVD (Chemical Vapor Deposition)[1]
Version—200 mm[1]
Vintage—01.06.1997[2]
Sources (3)Every fact above is drawn from these public sources
  1. [1]fabsurplus.comfabsurplus.com
  2. [2]fabsurplus.comfabsurplus.com
  3. [3]Equipment inventory listing