Waferpedia

Comparison ledger

E 500versus160 XP Ion

Agilent E 500, Varian 160 XP Ion, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
E 500Agilent
OEMAgilentVarian
CategoryIon ImplantationIon Implantation
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyAgilent E 500Varian 160 XP Ion
Cited variants—
Specifications
ConfigurationMedium Current[2]150mm High Current IMP[4]
ManufacturerAgilent[3]—
CategoryIon Implantation[3]—
Wafer size8 inch[2]—
TypeMedium current ion implanter[3]—
Vintage1996 vintage[2]—

Plan your fab

Building a Ion Implantation process? Get a complete equipment list.

Open the fab equipment planner →
Sources (4)Every fact above is drawn from these public sources
  1. [1]waferpedia.comwaferpedia.com
  2. [2]inventory listing
  3. [3]waferpedia.comwaferpedia.com
  4. [4]waferpedia.comwaferpedia.com