Comparison ledger
YES 1000P, YES G1000, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 1000PYES | G1000YES |
|---|---|---|
| OEM | YES | YES |
| Category | Wet Processing / Clean | Wet Processing / Clean |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | 1998 Acquisition | — |
| Control system | — | — |
| Generation | — | — |
| Family | YES 1000P | YES G1000 |
| Specifications | ||
| Model | 1000P[1] | — |
| System type | Plasma cleaning system[1] | — |
| Shelf configuration | Four 16 x 16 inch shelves[1] | — |
| Total capacity | 1024 square inches[1] | — |
| Control system | PLC driven with plain English real time process readout and diagnostics in the event of system abort[1] | — |
| Number of shelves | 4[1] | — |
| Shelf size | 16 x 16 inches[1] | — |
| Power | 1000 W[2] | — |
| Configuration | Parallel plate[2] | — |
| Operation modes | Active, RIE, Downstream[1] | — |
| Sample size range | From smallest semiconductor chip to large flat panels[1] | — |
| Plasma frequency | — | 40 kHz[3] |
| Powered shelves | — | 4 powered shelves[3] |
| Plasma modes | — | 5 plasma modes: Electron free / Downstream mode, Active mode, RIE mode, Active Ion trap, Downstream Ion trap[3] |
| Chamber | — | 1/2" 6061-T6 aluminum chamber[3] |
| Process area per tray | — | 15.13" W x 15.39" D[3] |
| Matching | — | Variable Frequency Matching (VFM)[3] |
| Interface | — | Touch Screen Interface[3] |
| Design | — | Unique downstream protective design; totally charge-free plasma[3] |
| Control | — | State logic control of output with input monitoring[3] |
| Number of powered shelves | — | 4[3] |
| Chamber material | — | 1/2" 6061-T6 aluminum[3] |
| Variable Frequency Matching (VFM) | — | Present[3] |
| Touch screen interface | — | Present[3] |
| Downstream protective design | — | Totally charge-free plasma[3] |
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