Comparison ledger
Tokyo Electron Expedius Plus, YES 1000P, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Expedius PlusTokyo Electron | 1000PYES |
|---|---|---|
| OEM | Tokyo Electron | YES |
| Category | Wet Processing / Clean | Wet Processing / Clean |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | 2007 Vintage | 1998 Acquisition |
| Control system | — | — |
| Generation | — | — |
| Family | Tokyo Electron Expedius | YES 1000P |
| Specifications | ||
| Application | Pre-Diffusion Clean[1] | — |
| Bath-1 | SPM[1] | — |
| Operating | 110 - 150°C, H2SO4/H2O2 (3:1), circulation[1] | — |
| Chemical spiking | auto concentration feedback[1] | — |
| Bath Material | Quartz[1] | — |
| Bath-2 | QDR (hot)[1] | — |
| Megasonic | 950 kHz, 2400W (600*4)[1] | — |
| Bath-3 | APM[1] | — |
| Bath-4 | POU[1] | — |
| Bath-5 | HPM[1] | — |
| Bath-6 | QDR (hot)[1] | — |
| Dryer | SD2[1] | — |
| Configuration | Resistivity monitoring (Horiba)[1] | Parallel plate[4] |
| OEM | Tokyo Electron[1] | — |
| Model | Expedius Plus[1] | 1000P[3] |
| Equipment type | Wet Bench[1] | — |
| Vintage | 2007[1] | — |
| System type | — | Plasma cleaning system[3] |
| Shelf configuration | — | Four 16 x 16 inch shelves[3] |
| Total capacity | — | 1024 square inches[3] |
| Control system | — | PLC driven with plain English real time process readout and diagnostics in the event of system abort[3] |
| Number of shelves | — | 4[3] |
| Shelf size | — | 16 x 16 inches[3] |
| Power | — | 1000 W[4] |
| Operation modes | — | Active, RIE, Downstream[3] |
| Sample size range | — | From smallest semiconductor chip to large flat panels[3] |
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