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Comparison ledger

Alpha 801 D Verticalversus0332 F 9453 302 Diffusion

Tokyo Electron Alpha 801 D Vertical, Varian 0332 F 9453 302 Diffusion, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
Alpha 801 D VerticalTokyo Electron
OEMTokyo ElectronVarian
CategoryThermal / DiffusionThermal / Diffusion
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyTokyo Electron AlphaVarian 0332 F 9453 302 Diffusion
Specifications
ConfigurationATM Oxide[1]—
Power AC480 V[1]—
Phase3 Phase[1]—
TypeVertical Furnace[1]—
Wafer Size8 inch[1]—
Process TypeATM Oxide (atmospheric oxide deposition)[1]—
Power480 V AC, 3 Phase[1]—
Frequency50/60 Hz[1]—
Asset Number—142841[2]
Last Confirm Date—October 14, 2025[3]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]Equipment inventory listing
  3. [3]fab-spares.comfab-spares.com