SUSS MicroTec
DSC300 Gen2 alternatives
Comparable Lithography equipment documented in the Waferpedia catalog.
6 comparable tools
SUSS MicroTec
MA300 Gen2
300mm
Lithography
The MA300 Gen2 is an automated mask aligner from SUSS MicroTec for proximity exposure of wafers up to 300 mm.
CHA
SE600
300mm
Lithography
The JEOL JBX-9500FS Electron Beam Lithography System can load substrates from 10 mm pieces to 300 mm wafers and write features less than 10 nm in size.
ASML
Twinscan XT 1950 Hi
300mm
Lithography
ASML Twinscan XT 1950 Hi is a scanner for 12-inch wafers used for 193 nm immersion lithography with 38 nm resolution capacity.
Zeiss
Ultra-55
300mm
Lithography
The Zeiss Ultra-55 SEM is used as the platform for Zyvex S-100 Nanoprobes.
Brooks
017-0024-01 Prealigner
Lithography
Brooks
017-0146-01 Prealigner
Lithography
Brooks 017-0146-01 is a prealigner manufactured by Brooks.
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