Waferpedia

Comparison ledger

AD12versusELP300 Gen2

SUSS MicroTec AD12, SUSS MicroTec ELP300 Gen2, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
AD12SUSS MicroTec
ELP300 Gen2SUSS MicroTec
OEMSUSS MicroTecSUSS MicroTec
Category——
Wafer size300mm300mm
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation—Gen2
FamilySUSS MicroTec AD12SUSS MicroTec ELP300 Gen2
Specifications
OperationManual[1]—
Wafer size300 mm[1]—
Process typeAqueous[1]—
CapabilitiesPuddle developing, Spray developing, Wafer cleaning[1]—
Automation—Automated[1]
Wafer Size—up to 300 mm[1]
Laser Type—Excimer Laser[1]
Processes—Alignment, Ablation, Laser-Assisted Debonding, Laser Seed Layer Removal[1]
Sources (1)Every fact above is drawn from these public sources
  1. [1]hilpert.chhilpert.ch